Chemically Amplified Resists. V Photochemical Proton Generation Mechanism from Triphenylsulfonium Salts.
Oikawa, Setsuko, Fujii, Norikazu, Hata, Masayuki, Tsuda, MinoruVolume:
7
Year:
1994
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.7.483
File:
PDF, 214 KB
english, 1994