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Transparent conductive Hf-doped In2O3 thin films by RF sputtering technique at low temperature annealing
Wang, G.H., Shi, C.Y., Zhao, L., Diao, H.W., Wang, W.J.Volume:
399
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2016.11.239
Date:
March, 2017
File:
PDF, 472 KB
english, 2017