Application of a Novel Aqueous Base Developable Resist in...

Journal of Photopolymer Science and Technology 2001 Vol. 14; Iss. 3

Application of a Novel Aqueous Base Developable Resist in Micromachining.

Raptis, Ioannis, Chatzichristidi, Margarita, Diakoumakos, Constantinos D., Douvas, Antonios, Niakoula, Dimitra, Argitis, Panagiotis
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Volume:
14
Year:
2001
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.14.445
File:
PDF, 378 KB
english, 2001
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