A Bi-Level Resist System with a Conductive Bottom Layer for EB Lithography.
Watanabe, Keiji, Yano, Ei, Namiki, Takahisa, Igarashi, Miwa, Kuramitsu, YohkoVolume:
6
Year:
1993
Language:
english
Journal:
Journal of Photopolymer Science and Technology
DOI:
10.2494/photopolymer.6.57
File:
PDF, 301 KB
english, 1993