Polishing-pad-free electrochemical mechanical polishing of single-crystalline SiC surfaces using polyurethane–CeO2 core–shell particles
Murata, Junji, Yodogawa, Koushi, Ban, KazumaVolume:
114
Language:
english
Journal:
International Journal of Machine Tools and Manufacture
DOI:
10.1016/j.ijmachtools.2016.11.007
Date:
March, 2017
File:
PDF, 1.73 MB
english, 2017