Remoldable Thiol–Ene Vitrimers for Photopatterning and Nanoimprint Lithography
Lyon, Gayla Berg, Cox, Lewis M., Goodrich, J. Taylor, Baranek, Austin D., Ding, Yifu, Bowman, Christopher N.Volume:
49
Language:
english
Journal:
Macromolecules
DOI:
10.1021/acs.macromol.6b01281
Date:
December, 2016
File:
PDF, 3.44 MB
english, 2016