Simulation of nucleation and growth of atomic layer deposition phosphorus for doping of advanced FinFETs
Seidel, Thomas E., Goldberg, Alexander, Halls, Mat D., Current, Michael I.Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4938585
Date:
January, 2016
File:
PDF, 789 KB
english, 2016