Simulation of nucleation and growth of atomic layer...

Simulation of nucleation and growth of atomic layer deposition phosphorus for doping of advanced FinFETs

Seidel, Thomas E., Goldberg, Alexander, Halls, Mat D., Current, Michael I.
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Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4938585
Date:
January, 2016
File:
PDF, 789 KB
english, 2016
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