Target poisoning during CrN deposition by mixed high power...

Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique

Purandare, Yashodhan P., Ehiasarian, Arutiun P., Eh Hovsepian, Papken
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Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4950886
Date:
July, 2016
File:
PDF, 1.68 MB
english, 2016
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