[ACS Symposium Series] Polymers for Microelectronics Volume...

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[ACS Symposium Series] Polymers for Microelectronics Volume 537 (Resists and Dielectrics) || Chemically Amplified Deep-UV Photoresists Based on Acetal-Protected Poly(vinylphenols)

Thompson, Larry F., Willson, C. Grant, Tagawa, Seiichi
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Volume:
10.1021/bk
Year:
1993
Language:
english
DOI:
10.1021/bk-1994-0537.ch003
File:
PDF, 1.13 MB
english, 1993
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