Mechanistic modeling study on process optimization and precursor utilization with atmospheric spatial atomic layer deposition
Deng, Zhang, He, Wenjie, Duan, Chenlong, Chen, Rong, Shan, BinVolume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4932564
Date:
January, 2016
File:
PDF, 1.71 MB
english, 2016