Mechanistic modeling study on process optimization and...

Mechanistic modeling study on process optimization and precursor utilization with atmospheric spatial atomic layer deposition

Deng, Zhang, He, Wenjie, Duan, Chenlong, Chen, Rong, Shan, Bin
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Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4932564
Date:
January, 2016
File:
PDF, 1.71 MB
english, 2016
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