Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2015 / 09 Vol. 33; Iss. 5
Co-implantation of Al + , P + , and S + with Si + implants into In 0.53 Ga 0.47 As
Lind, Aaron G., Aldridge, Henry L., Jones, Kevin S., Hatem, ChristopherVolume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4931030
Date:
September, 2015
File:
PDF, 564 KB
english, 2015