Quantum confinement and electron spin resonance characteristics in Si-implanted silicon oxide films
Gritsenko, V. A., Nadolinny, V. A., Zhuravlev, K. S., Xu, J. B., Wong, H.Volume:
109
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3573482
Date:
April, 2011
File:
PDF, 363 KB
english, 2011