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Modelling and Simulation of the Advanced Plasma Source
Schroeder, Benjamin, Peter, Ralf, Harhausen, Jens, Ohl, AndreasVolume:
110
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3626806
Date:
August, 2011
File:
PDF, 899 KB
english, 2011