A stochastic model of solid state thin film deposition:...

AIP Advances 2016 / 04 Vol. 6; Iss. 4

A stochastic model of solid state thin film deposition: Application to chalcopyrite growth

Lovelett, Robert J., Pang, Xueqi, Roberts, Tyler M., Shafarman, William N., Birkmire, Robert W., Ogunnaike, Babatunde A.
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Volume:
6
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.4948404
Date:
April, 2016
File:
PDF, 900 KB
english, 2016
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