In-situ monitoring of etch uniformity using...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2015 / 05 Vol. 33; Iss. 3

In-situ monitoring of etch uniformity using plasma emission interferometry

Samara, Vladimir, de Marneffe, Jean-Francois, el Otell, Ziad, Economou, Demetre J.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4917168
Date:
May, 2015
File:
PDF, 1.95 MB
english, 2015
Conversion to is in progress
Conversion to is failed