Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2015 / 05 Vol. 33; Iss. 3
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In-situ monitoring of etch uniformity using plasma emission interferometry
Samara, Vladimir, de Marneffe, Jean-Francois, el Otell, Ziad, Economou, Demetre J.Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4917168
Date:
May, 2015
File:
PDF, 1.95 MB
english, 2015