PMMA removal options by wet development in PS-...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2015 / 09 Vol. 33; Iss. 5

PMMA removal options by wet development in PS- b -PMMA block copolymer for nanolithographic mask fabrication

Gharbi, Ahmed, Tiron, Raluca, Pimenta Barros, Patricia, Argoud, Maxime, Servin, Isabelle, Chevalier, Xavier, Nicolet, Celia, Navarro, Christophe
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Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4929548
Date:
September, 2015
File:
PDF, 2.22 MB
english, 2015
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