Fast spatial atomic layer deposition of Al 2 O 3 at low temperature (
Choi, Hagyoung, Shin, Seokyoon, Jeon, Hyeongtag, Choi, Yeongtae, Kim, Junghun, Kim, Sanghun, Chung, Seog Chul, Oh, KiyoungVolume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4934752
Date:
January, 2016
File:
PDF, 1.73 MB
english, 2016