Low-temperature atomic layer deposition of TiO 2 thin layers for the processing of memristive devices
Porro, Samuele, Jasmin, Alladin, Bejtka, Katarzyna, Conti, Daniele, Perrone, Denis, Guastella, Salvatore, Pirri, Candido F., Chiolerio, Alessandro, Ricciardi, CarloVolume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4938465
Date:
January, 2016
File:
PDF, 1.43 MB
english, 2016