RF magnetron sputtering deposition of NiO/Ni bilayer and...

Journal of Magnetism and Magnetic Materials 2017 / 04 Vol. 428

RF magnetron sputtering deposition of NiO/Ni bilayer and approach of the Magnetic behavior using the Preisach model

Bendjerad, A., Boukhtache, S., Benhaya, A., Lahmar, A., Zergoug, M., Luneau, D.
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Volume:
428
Language:
english
Journal:
Journal of Magnetism and Magnetic Materials
DOI:
10.1016/j.jmmm.2016.12.049
Date:
April, 2017
File:
PDF, 788 KB
english, 2017
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