Patterning of Polymer Arrays with Enhanced Aspect-Ratio...

Advanced Materials Research 2015 / 7 Vol. 1119

Patterning of Polymer Arrays with Enhanced Aspect-Ratio Using Hybrid Substrate Conformal Imprint Lithography

Kolli, Vijay Ramya, Woidt, Carsten, Hillmer, Hartmut
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Volume:
1119
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.1119.179
Date:
July, 2015
File:
PDF, 687 KB
english, 2015
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