Plasma-free atomic layer deposition of Ru thin films using...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2016 / 05 Vol. 34; Iss. 3

Plasma-free atomic layer deposition of Ru thin films using H 2 molecules as a nonoxidizing reactant

Lee, Seung-Joon, Kim, Soo-Hyun, Saito, Masayuki, Suzuki, Kazuharu, Nabeya, Shunichi, Lee, Jeongyeop, Kim, Sangdeok, Yeom, Seungjin, Lee, Do-Joong
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Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4946755
Date:
May, 2016
File:
PDF, 1.22 MB
english, 2016
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