Depth profile study of Ti implanted Si at very high doses
Olea, J., Pastor, D., Toledano-Luque, M., Mártil, I., González-Díaz, G.Volume:
110
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3626466
Date:
September, 2011
File:
PDF, 2.51 MB
english, 2011