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Impact of interstitial oxygen trapped in silicon during plasma growth of silicon oxy-nitride films for silicon solar cell passivation
Saseendran, Sandeep S., Saravanan, S., Raval, Mehul C., Kottantharayil, AnilVolume:
119
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4943177
Date:
March, 2016
File:
PDF, 1.18 MB
english, 2016