Band offsets for biaxially and uniaxially stressed silicon-germanium layers with arbitrary substrate and channel orientations
Eneman, Geert, Roussel, Philippe, Brunco, David Paul, Collaert, Nadine, Mocuta, Anda, Thean, AaronVolume:
120
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4960140
Date:
August, 2016
File:
PDF, 3.44 MB
english, 2016