Bias Temperature Instability (BTI) in high-mobility channel devices with high-k dielectric stacks: SiGe, Ge, and InGaAs
Franco, J., Kaczer, B., Vais, A., Alian, A., Arimura, H., Putcha, V., Sioncke, S., Waldron, N., Zhou, D., Nyns, L., Mitard, J., Witters, L., Heyns, M., Groeseneken, G., Collaert, N., Linten, D., TheanVolume:
1
Year:
2016
Language:
english
Journal:
MRS Advances
DOI:
10.1557/adv.2016.387
File:
PDF, 1.26 MB
english, 2016