Low-temperature atomic layer deposition of copper(II) oxide thin films
Iivonen, Tomi, Hämäläinen, Jani, Marchand, Benoît, Mizohata, Kenichiro, Mattinen, Miika, Popov, Georgi, Kim, Jiyeon, Fischer, Roland A., Leskelä, MarkkuVolume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4933089
Date:
January, 2016
File:
PDF, 2.22 MB
english, 2016