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Plasma enhanced atomic layer deposition of molybdenum carbide and nitride with bis( tert -butylimido)bis(dimethylamido) molybdenum
Bertuch, Adam, Keller, Brent D., Ferralis, Nicola, Grossman, Jeffrey C., Sundaram, GaneshVolume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4972776
Date:
January, 2017
File:
PDF, 1.90 MB
english, 2017