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Electron-Beam-Induced Decomposition Mechanisms of High-Sensitivity Chlorinated Resist ZEP520A
Oyama, Tomoko Gowa, Enomoto, Kazuyuki, Hosaka, Yuji, Oshima, Akihiro, Washio, Masakazu, Tagawa, SeiichiVolume:
5
Language:
english
Journal:
Applied Physics Express
DOI:
10.1143/APEX.5.036501
Date:
February, 2012
File:
PDF, 962 KB
english, 2012