![](/img/cover-not-exists.png)
Consequences of plasma oxidation and vacuum annealing on the chemical properties and electron accumulation of In 2 O 3 surfaces
Berthold, Theresa, Rombach, Julius, Stauden, Thomas, Polyakov, Vladimir, Cimalla, Volker, Krischok, Stefan, Bierwagen, Oliver, Himmerlich, MarcelVolume:
120
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4972474
Date:
December, 2016
File:
PDF, 1.22 MB
english, 2016