ELECTRICAL PROPERTIES OF Al/p-Si STRUCTURE WITH Al...

Surface Review and Letters 2016 / 11

ELECTRICAL PROPERTIES OF Al/p-Si STRUCTURE WITH Al 2 O 3 THIN FILM FABRICATED BY ATOMIC LAYER DEPOSITION SYSTEM

YILDIZ, DILBER ESRA, CAVUŞ, HATICE KANBUR
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Language:
english
Journal:
Surface Review and Letters
DOI:
10.1142/S0218625X17500779
Date:
November, 2016
File:
PDF, 404 KB
english, 2016
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