Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment
Maas, D. J., Fliervoet, T., Herfst, R., van Veldhoven, E., Meessen, J., Vaenkatesan, V., Sadeghian, H.Volume:
86
Language:
english
Journal:
Review of Scientific Instruments
DOI:
10.1063/1.4932038
Date:
October, 2015
File:
PDF, 8.54 MB
english, 2015