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Enhancement of SiO 2 /Si(001) interfacial oxidation induced by thermal strain during rapid thermal oxidation
Ogawa, Shuichi, Tang, Jiayi, Yoshigoe, Akitaka, Ishidzuka, Shinji, Takakuwa, YujiVolume:
145
Language:
english
Journal:
The Journal of Chemical Physics
DOI:
10.1063/1.4962671
Date:
September, 2016
File:
PDF, 522 KB
english, 2016