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Quantitative studies of electric field intensity on atom diffusion of Cu/Ta/Si stacks during annealing
Wang, Lei, Asempah, Isaac, Dong, Song-Tao, Yin, Pian-Pian, Jin, LeiVolume:
399
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2016.12.061
Date:
March, 2017
File:
PDF, 1.67 MB
english, 2017