Depth profiling investigation by pARXPS and MEIS of...

Microelectronic Engineering 2017 / 02 Vol. 169

Depth profiling investigation by pARXPS and MEIS of advanced transistor technology gate stack

Fauquier, L., Pelissier, B., Jalabert, D., Pierre, F., Gassilloud, R., Doloy, D., Beitia, C., Baron, T.
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Volume:
169
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2016.11.018
Date:
February, 2017
File:
PDF, 843 KB
english, 2017
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