Preventing the accelerated low-temperature oxidation of MoSi2(pesting) by the application of superficial alkali-salt layers
B. V. Cockeram, G. Wang, R. A. RappVolume:
45
Language:
english
Pages:
32
DOI:
10.1007/bf01046821
Date:
February, 1996
File:
PDF, 5.04 MB
english, 1996