Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization
Tucker, M. D., Ganesan, R., McCulloch, D. G., Partridge, J. G., Stueber, M., Ulrich, S., Bilek, M. M. M., McKenzie, D. R., Marks, N. A.Volume:
119
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4946841
Date:
April, 2016
File:
PDF, 981 KB
english, 2016