Novel chemical vapor deposition process of ZnO films using nonequilibrium N 2 plasma generated near atmospheric pressure with small amount of O 2 below 1%
Nose, Yukinori, Yoshimura, Takeshi, Ashida, Atsushi, Uehara, Tsuyoshi, Fujimura, NorifumiVolume:
119
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4948326
Date:
May, 2016
File:
PDF, 1.18 MB
english, 2016