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Operational stability of solution based zinc tin oxide/SiO 2 thin film transistors under gate bias stress
Kiazadeh, Asal, Salgueiro, Daniela, Branquinho, Rita, Pinto, Joana, Gomes, Henrique L., Barquinha, Pedro, Martins, Rodrigo, Fortunato, ElviraVolume:
3
Language:
english
Journal:
APL Materials
DOI:
10.1063/1.4919057
Date:
June, 2015
File:
PDF, 2.69 MB
english, 2015