Microwave Annealing of Very High Dose Aluminum-Implanted...

Applied Physics Express 2011 / 10 Vol. 4; Iss. 11

Microwave Annealing of Very High Dose Aluminum-Implanted 4H-SiC

Nipoti, Roberta, Nath, Anindya, Rao, Mulpuri V., Hallén, Anders, Carnera, Alberto, Tian, Yong-Lai
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Volume:
4
Language:
english
Journal:
Applied Physics Express
DOI:
10.1143/APEX.4.111301
Date:
October, 2011
File:
PDF, 332 KB
english, 2011
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