SiO2 etching in an Ar/c-C4F8/O2 dual frequency capacitively coupled plasma
Rauf, Shahid, Balakrishna, AjitVolume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4973299
Date:
March, 2017
File:
PDF, 1.60 MB
english, 2017