SiO2 etching in an Ar/c-C4F8/O2 dual frequency capacitively...

SiO2 etching in an Ar/c-C4F8/O2 dual frequency capacitively coupled plasma

Rauf, Shahid, Balakrishna, Ajit
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4973299
Date:
March, 2017
File:
PDF, 1.60 MB
english, 2017
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