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Comparison of optimised conditions for inductively coupled plasma-reactive ion etching of quartz substrates and its optical applications
Lin, Yu-Hsin, Tang, Yu-Hsiang, Hsiao, Chien-Nan, Chen, Po-Li, Shiao, Ming-HuaVolume:
9
Language:
english
Journal:
Micro & Nano Letters
DOI:
10.1049/mnl.2014.0093
Date:
June, 2014
File:
PDF, 475 KB
english, 2014