Structural characterization of the interface structure of amorphous silicon thin films after post-deposition argon or hydrogen plasma treatment
Neumüller, Alex, Sergeev, Oleg, Vehse, Martin, Agert, CarstenVolume:
403
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2017.01.188
Date:
May, 2017
File:
PDF, 754 KB
english, 2017