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Fabrication of high-aspect-ratio double-slot photonic crystal waveguide in InP heterostructure by inductively coupled plasma etching using ultra-low pressure
Cui, Kaiyu, Li, Yongzhuo, Feng, Xue, Huang, Yidong, Zhang, WeiVolume:
3
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.4793082
Date:
February, 2013
File:
PDF, 1.16 MB
english, 2013