[IEEE 2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) - Chongqing, China (2016.7.18-2016.7.22)] 2016 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO) - Superresolution nanolithography technique based on polydimethylsiloxane soft mold
He, Chuanwang, Dong, Xiaochun, He, Chuanwang, Wang, PingheYear:
2016
Language:
english
DOI:
10.1109/3M-NANO.2016.7824990
File:
PDF, 415 KB
english, 2016