Fluorocarbon assisted atomic layer etching of SiO 2 and Si using cyclic Ar/C 4 F 8 and Ar/CHF 3 plasma
Metzler, Dominik, Li, Chen, Engelmann, Sebastian, Bruce, Robert L., Joseph, Eric A., Oehrlein, Gottlieb S.Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4935462
Date:
January, 2016
File:
PDF, 3.26 MB
english, 2016