Self-Terminating Confinement Approach for Large-Area...

ACS Nano 2017 / 02 Vol. 11; Iss. 2

Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiO x by Chemical Vapor Deposition

Pang, Jinbo, Mendes, Rafael G., Wrobel, Pawel S., Wlodarski, Michal D., Ta, Huy Quang, Zhao, Liang, Giebeler, Lars, Trzebicka, Barbara, Gemming, Thomas, Fu, Lei, Liu, Zhongfan, Eckert, Juergen, Bachma
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Volume:
11
Language:
english
Journal:
ACS Nano
DOI:
10.1021/acsnano.6b08069
Date:
February, 2017
File:
PDF, 1.41 MB
english, 2017
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