Sub-10 nm Ta Channel Responsible for Superior Performance of a HfO2 Memristor
Jiang, Hao, Han, Lili, Lin, Peng, Wang, Zhongrui, Jang, Moon Hyung, Wu, Qing, Barnell, Mark, Yang, J. Joshua, Xin, Huolin L., Xia, QiangfeiVolume:
6
Language:
english
Journal:
Scientific Reports
DOI:
10.1038/srep28525
Date:
September, 2016
File:
PDF, 1.26 MB
english, 2016