Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
Lee, Inhye, Park, Jingyu, Jeon, Heeyoung, Kim, Hyunjung, Shin, Changhee, Shin, Seokyoon, Lee, Kunyoung, Jeon, HyeongtagVolume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4943090
Date:
May, 2016
File:
PDF, 1.52 MB
english, 2016