Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2017 / 01 Vol. 35; Iss. 1
Influence of SiH 4 and pressure on PECVD preparation of silicon films with subwavelength structures
Hernández-Montero, William W., Zúñiga-Islas, Carlos, Itzmoyotl-Toxqui, Adrián, Molina-Reyes, Joel, Serrano-De la Rosa, Laura E.Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4973303
Date:
January, 2017
File:
PDF, 2.63 MB
english, 2017