SPIE Proceedings [SPIE International Symposium on Optoelectronic Technology and Application 2016 - Beijing, China (Monday 9 May 2016)] Infrared Technology and Applications, and Robot Sensing and Advanced Control - Optimization of plasma etching of SiO 2 as hard mask for HgCdTe dry etching
Chen, Yiyu, Ye, Zhenhua, Sun, Changhong, Zhang, Shan, Xin, Wen, Hu, Xiaoning, Ding, Ruijun, He, LiVolume:
10157
Year:
2016
Language:
english
DOI:
10.1117/12.2247502
File:
PDF, 368 KB
english, 2016